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Nova 200 NanoLab

DualBeam--SEM/FIB for Nanoscale Prototyping, Machining, Characterization, and Analysis of Structures below 100 nm

Revolution

The Nova NanoLab brings new capabilities and flexibility to researchers and developers needing to create, modify, and characterize complex structures below 100 nanometers. It combines ultra-high resolution field emission scanning electron microscopy (SEM) and precise focused ion beam (FIB) etch and deposition to complement the existing Nanotechnology laboratory tools and extend the applications range for nanoscale prototyping, machining, 2D and 3D-characterization,and analysis. Setting the Nova NanoLab apart from other lab systems are its integrated 3D-characterization,nano-machining and nano-analysis capabilities. The Nova NanoLab is designed to be just that: a complete nanotechnology laboratory in one tool.

Comprehensive beam chemistries for deposition and etch, and automation enable creation of structures such as:

• nanotube-based nano-structure assembly;

• nano-bridge creation;

• photonic array prototyping;

• laser prototyping;

• nano-stamping;

• AFM tip modification;

• MEMS modification.

For further information, please contact Mr. PENG Kaiwu. Tel: +86-10-82545516, email: pengkw@nanoctr.cn